Deposition

The next inflection in #semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states. This proprietary algorithm instantly reduces reflected power in processes with shorter RF on times. Paired with the eVerest™ generator, NavX RF match network completes AE’s latest RF plasma power delivery system, enabling unparalleled control of plasma characteristics as the industry sets its sights on Angstrom scale geometries.