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The precise performance and sophisticated controls of AE's plasma power delivery, temperature measurement, temperature control, and wafer control solutions help enhance repeatability and yield. We offer a broad range of RF, DC, and pulsed-DC power delivery systems and a variety of matching networks to meet specific process requirements.
Comprehensive Portfolio of Solutions for Enhanced Process Control
Advanced Energy’s RF plasma power delivery and high-speed matching technology enable customized and optimized performance for demanding PECVD and PEALD deposition processes. Our DC technologies provide configurable arc response, power accuracy, and process repeatability for PVD (sputtering) and ECD deposition processes. We also offer temperature monitoring, temperature control, and wafer control technologies for precision across numerous aspects of the manufacturing process.
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Unleash the Power: NavX™ RF Matching Network
Jun 25, 2024
The next inflection in #semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states. This proprietary algorithm instantly reduces reflected power in processes with shorter RF on times. Paired with the eVerest™ generator, NavX RF match network completes AE’s latest RF plasma power delivery system, enabling unparalleled control of plasma characteristics as the industry sets its sights on Angstrom scale geometries.
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