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eVerest RF Generator
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Angstrom-Era Precision Power
As the semiconductor industry speeds toward a new inflection, the eVerest™ RF generator fills the need for transformational plasma control. Its configurable multi-level pulsing enables instantaneous or user-defined transition timing. Additionally, high-speed, high-accuracy model-based frequency tuning with wide frequency sweep range provides greater process stability and control. These capabilities, plus faster setpoint response, controlled overshoot at the beginning of pulsing states, and sophisticated PowerInsight by Advanced Energy™ IoT intelligence empower process innovation for the next technology node.
特徴
- Full RF delivery system, multiple options for matching solutions, and intelligent synchronization
- Speed and control within programmable multi-level pulse profiles
- High-speed RF output response and pulse-state rise/fall times
- Up to ±10% frequency tuning range
- Designed-in dP/dZ stability
- PowerInsight by Advanced Energy™ IoT ecosystem
メリット
- Enables novel process development for < 2 nm deposition and etch profiles
- Provides reliable ignition with RF stability independent of cable length
- Integrates seamlessly into any plasma system
- Increases process space and widens stability window
- Backed by worldwide product and application support from local service centers
仕様
| 冷却: | Water |
|---|---|
| 出力周波数（MHz、kHz）: | 1 to 60 MHz |
| 入力電圧 (V): | 208, 400-480 VAC |
| 出力レベル（kW）: | 3.5 to 10 kW |
| ラック幅: | Half and Full rack |
| 高さ（インチ）: | 3U |
| 通信インターフェース: | EtherCAT, Ethernet, RS-232, DeviceNet |
| 高度な機能: | Multi-level Pulsing, arc management, CEX, MBFT |
技術文書
テクニカル・ビデオ
Unleash the Power: NavX™ RF Matching Network
6月 25, 2024
The next inflection in #semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states. This proprietary algorithm instantly reduces reflected power in processes with shorter RF on times. Paired with the eVerest™ generator, NavX RF match network completes AE’s latest RF plasma power delivery system, enabling unparalleled control of plasma characteristics as the industry sets its sights on Angstrom scale geometries.
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