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Remote Plasma Sources

Empower your manufacturing and abatement processes with the high functionality and exceptional reliability of Advanced Energy's remote plasma sources. Tailor your chemistry, broaden your operating range, and elevate your process rates. Our sophisticated options, presented in streamlined designs, enable you to achieve higher levels of efficiency and productivity.

Remote Plasma Sources

MAXstream Remote Plasma Source

  • Multiple models: MAXstream 300 for low flow applications and MAXstream 1200 for higher flow applications
  • Highly reliable RPS maximizes tool uptime

Rapid Ox Remote Plasma Source

  • Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
  • Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
  • Improved thermal management helps ensure long chamber lifetime

Xstream Remote Plasma Source

  • Highly reliable RPS maximizes tool uptime
  • Effective reactive species transportation to process chamber for improved performance
  • Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)

Featured Products

Featured

MAXstream Remote Plasma Source

Reliable Performance for Chamber Clean Applications

Datasheet

Technical Documentation

Title Type
RAPID OX (812 KB) Brochure
采用主动匹配网络的XSTREAM远程等离子体源 (1 MB) Brochure
MAXStream 1200 Datasheet (382 KB) Data Sheet
MAXstream 300 Data Sheet (228 KB) Data Sheet
Rapid OX RPS Data Sheet (402 KB) Data Sheet
Xstream RPS Data Sheet (891 KB) Data Sheet
3 Tips for Sourcing Chamber Cleaning RPS Systems (4 MB) Infographic
Advanced Ignition RPS (938 KB) White Paper
RPS Chamber Anodization (499 KB) White Paper
RPS Chamber Cleaning System Impact on Cost of Ownership (856 KB) White Paper

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