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With sophisticated, high-precision plasma power delivery systems, Advanced Energy is at the forefront of technology for etching applications. Our solutions harness cutting-edge innovation to provide exacting power delivery and control throughout the etching process.
Comprehensive Portfolio of Solutions for Enhanced Process Control
AE's plasma power supplies are customized to suit the unique needs of each etching application. Our portfolio includes RF, DC, and pulsed-DC products, impedance matching networks, remote plasma sources, and a sophisticated data collection, visualization, and analysis platform. Built with cutting-edge technology, these solutions ensure exact, repeatable power delivery for superior process precision and yield.
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Featured Products
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Featured Resources
PowerInsight by Advanced Energy Brochure
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Three Key Cabling Decisions to Optimize RF System Performance
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Navigator II Digital Matching Networks Brochure
Navigator II matching network provides rapid, accurate, and reliable matching across a wide range of power requirements. Download Navigator II Brochure for details regarding product specifications, electrical specifications, mechanical specifications and more
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Electrostatic Semiconductor Wafer Clamping/Chucking System (ESC) Application Note
The electrostatic chuck (ESC) is used in a variety of semiconductor processes to hold the wafer during processing.
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Technical Videos
Unleash the Power: NavX™ RF Matching Network
Jun 25, 2024
The next inflection in #semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states. This proprietary algorithm instantly reduces reflected power in processes with shorter RF on times. Paired with the eVerest™ generator, NavX RF match network completes AE’s latest RF plasma power delivery system, enabling unparalleled control of plasma characteristics as the industry sets its sights on Angstrom scale geometries.
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