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远程等离子体源

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Advanced Energy 的远程等离子体源功能强大、可靠性高，可增强您的制造和清除工艺。助您定制化学特征，扩展工作范围，提高工艺处理速度。我们先进的方案采用流线型设计，让您能够实现更高水平的效率和生产率。

远程等离子体源

MAXstream Remote Plasma Source

  • Multiple models: MAXstream 300 for low flow applications and MAXstream 1200 for higher flow applications
  • Highly reliable RPS maximizes tool uptime

Rapid Ox Remote Plasma Source

  • Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
  • Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
  • Improved thermal management helps ensure long chamber lifetime

Xstream Remote Plasma Source

  • Highly reliable RPS maximizes tool uptime
  • Effective reactive species transportation to process chamber for improved performance
  • Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)

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MAXstream Remote Plasma Source

Reliable Performance for Chamber Clean Applications

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