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首页产品等离子电源产品远程等离子体源

远程等离子体源

Advanced Energy 的远程等离子体源功能强大、可靠性高，可增强您的制造和清除工艺。助您定制化学特征，扩展工作范围，提高工艺处理速度。我们先进的方案采用流线型设计，让您能够实现更高水平的效率和生产率。

远程等离子体源

MAXstream Remote Plasma Source

Multiple models: MAXstream 300 for low flow applications and MAXstream 1200 for higher flow applications
Highly reliable RPS maximizes tool uptime

Rapid Ox Remote Plasma Source

Quartz liner makes it ideal for photoresist ashing or carbon chamber clean processes
Variable frequency matching provides a range of plasma impedance operation, controlled by varying gas chemistry, pressure, and power set point
Improved thermal management helps ensure long chamber lifetime

Xstream Remote Plasma Source

Highly reliable RPS maximizes tool uptime
Effective reactive species transportation to process chamber for improved performance
Transformer coupled plasma (TCP) source with integrated Active Match Network (AMN)

特色产品

特色

MAXstream Remote Plasma Source

Reliable Performance for Chamber Clean Applications

技术文档

标题	类型
采用主动匹配网络的XSTREAM远程等离子体源 (1 MB)	手册
RAPID OX (812 KB)	手册
MAXStream 1200 Datasheet (382 KB)	数据表
MAXstream 300 Data Sheet (228 KB)	数据表
Rapid OX RPS Data Sheet (402 KB)	数据表
Xstream RPS Data Sheet (891 KB)	数据表
3 Tips for Sourcing Chamber Cleaning RPS Systems (4 MB)	信息图表
Advanced Ignition RPS (938 KB)	白皮书
RPS Chamber Anodization (499 KB)	白皮书
RPS Chamber Cleaning System Impact on Cost of Ownership (856 KB)	白皮书

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