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Philipp Dürrenfeld
Advanced Energy
Philipp is an R&D Scientist at Advanced Energy. He has a background in thin film magnetism and nanostructuring for electronic devices. Prior to AE, he worked at academic sites in Sweden, China, and Germany.
Articles published by Philipp Dürrenfeld
Blog
Studies of Dynamic Reverse Pulsing and Bipolar Reactive Sputtering of Silicon Oxide Films with No Detectable Inclusion of Anode Material
October 13, 2020
In our recent blog post, we demonstrated how silicon dioxide thin films can be sputtered with a reliably high quality and rate in an inline coating machine at our Customer Solutions Lab in Karlstein, Germany. Comparisons were made for films sputtered at a high argon flow, and thus higher-pressure, during deposition and a low argon flow and thus a lower deposition pressure.
Blog
Dynamic Reverse Pulsing Enables High Deposition Rate at Lower Total Cost of Ownership for Reactive Sputtering on Heat-Sensitive Substrates
April 07, 2020
You might not be consciously aware of it, but there’s a good chance one of the reasons you chose the smartphone you have is that it felt good in your hands. A lot of time, thought and research went into making it feel “just right” to you.