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Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes with our plasma power generators’ precise performance and comprehensive controls and capabilities.
Plasma Power Product Types
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Integrated Systems | The Omni™ RF diagnostic cart is a comprehensive solution to optimize power delivery for critical semiconductor processes. | |||||||||
Pulsed and DC Power Systems | Advanced Dual-Magnetron Sputtering Accessories | 0.5 to 50 kHz | 40 to 120 kW | 100 to 240 VAC | Full rack | 6U, 10U | 400-1000 V | |||
Pulsed and DC Power Systems | Unprecedented Power Control for Single- and Dual-Magnetron Sputtering | 5 to 150 kHz | 10 to 30 kW | 400, 440, 440-480 VAC | Full rack | 4U, 6U | 400-1000V | |||
RF Plasma Generators | Angstrom Era Precision Power | 1 to 60 MHz | 3.5 to 10 kW | 208, 400-480 VAC | Half and Full rack | 3U | ||||
Power Delivery Systems | 0.2 to 1.1 MHz | 400, 480 VAC +/-10% | 19 | 8U | 5 kV | |||||
Pulsed and DC Power Systems | Solvix DC and pulsed-DC power supplies for metallic and reactive sputtering offer a wide range of power and frequency levels, pulsing, and multiple communications options. | Pulsing and non-pulsing options available. Please refer to Datasheet. | Multiple options available. Please refer to Datasheet. | 400, 480 VAC | Full Rack | 4U, 6U | ||||
Pulsed and DC Power Systems | PEII series low-frequency power supplies provide enhanced arc control with internal load matching for 40 kHz reactive sputtering applications. | 40 kHz | 5, 10 kW | 208, 400 VAC | Full Rack | 4U | ||||
RF Match Networks | Rapid, Accurate, and Reliable Digitally-Tuned Matching | 400 kHz to 60 MHz | 1 to 60 kW | 110 VAC | N/A, chamber mounted | |||||
Pulsed and DC Power Systems | Stable Power Delivery for Extreme Arc Conditions and Highly Repeatable Films | 0.5 to 5 kHz | 30 to 60 kW | 400, 440, 480 VAC | Full rack | 6U | 400-1000 V | |||
RF Match Networks | Ultrafast, RF-Synchronized Tuning to Multi-Level Pulse States | 1MHz to 60 MHz | 1 to 10 kW | 24 VDC |
Featured Products
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Technical Videos
Advanced Energy’s eVoS™: A Paradigm Shift in Semiconductor Bias Technology
Feb 6, 2024
Learn more about AE's eVoS(TM) Assymetric Bias Waveform Generator: By maximizing the ability to tailor ion energy, eVoS enables precise command of #semiconductor etch and deposition geometries at very small dimensions. Direct control of wafer-surface voltage and ion energy distribution (IED) empowers process engineers to optimize bias performance for specific process results, ensuring sensitive feature formation. In addition, fast digital metrology and novel control algorithms enable the production of narrower IEDs compared to alternative technologies. These capabilities change what’s possible in plasma processing.
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